Silicon carbide semiconductor
The third-generation of semiconductor materials made from silicon carbide are after the first generation elemental semiconductors (Si and Ge) as well as the second generation compound semiconductors. The characteristics of silicon carbide as a semiconductor material have a large band gap. They are strong in radiation resistance and chemical stability. Due to its high temperature resistance, high frequency and resistance to pressure it has been used extensively in the power electronics field.
SiC can be found in many polycrystalline structures called polymorphisms. 4H SiC is the preferred choice when it comes to actual power device production. There are single crystal 4H–SiC wafers available with diameters from 3 to 6 inches.
Silicon carbide vs. Si
SiC offers ten-fold greater dielectric breakdown strength than Si, three-fold more band gaps, and three times higher thermal conductivity. SiC can be used at higher temperatures and can resist higher levels of breakdown voltage.
Preparation and use of single SiC SiC-rich crystal
Silicon carbide substrates can be prepared using PVT, solution or HTCVD. The world’s most popular method for preparing silicon carbide single crystals is the PVT technique. SiC single crystal growth involves three steps: Acheson, Lely and modified Lely.
SiC crystals can also be grown using sublimation methods, such as the Lely method. You place the SiC powder between a graphite crucible, porous graphite tube, and it is sublimated. It then gets grown in an inert gas (argon), at an ambient temperature of 2500. It is possible to form flake SiC crystals.
But, as the Lely method relies on spontaneous nucleation, it’s difficult to manage the crystal shape of SiC crystals grown by this method. Also, crystal size can be very limited. There was an improvement to the Lely method: The physical gas transport method (or PVT). It has the advantage that SiC seed crystals are used to control the crystal structure of the grown crystal. This overcomes some of the weaknesses of Lay method of spontane nucleation. The single crystal SiC crystal can then be obtained and can also grow the larger SiC single crystalline.
Silicon carbide ceramic
The process of reactive bonding which is used to make silicon carbide ceramics was created by Edward G. Acheson (1891). The Acheson process is where pure silica and coke react with an electric furnace. It can be heated to temperatures of between 2200 and 2480 degrees Celsius (4000 deg-4500 F). SiC ceramics exhibit excellent high-temperature bearing strength and dimension stability. Their high thermal conductivity makes them resistant to heat shock. High thermal conductivity is used to prevent extreme temperatures differences between layers. This can be a source of thermal expansion stress. SiC makes a great kiln-furniture to help other ceramics through the firing process.
Silicon carbide Price
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Silicon carbide Supplier
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